Integrated Circuit Ultra-pure Water System
Process flow:
Raw water → raw water pressure pump → multi-media filter → activated carbon filter → water softener → precision filter → positive resin filter bed → negative resin filter bed → mixed bed of Yin and Yang resin → Microporous filter → water point
Raw water → raw water pressure pump → multi-media filter → activated carbon filter → water softening device → precision filter → first stage reverse osmosis →PH regulation → Intermediate water tank → second stage reverse osmosis (reverse osmosis membrane surface with positive charge) → purified water tank → pure water pump → microporous filter → water point
Raw water → raw water pressure pump → multi-media filter → activated carbon filter → water softening device → precision filter → primary reverse osmosis machine → intermediate water tank → intermediate water pump →EDI system → Microporous filter → water point
For the current ultra-pure water equipment for integrated circuits, advanced automatic two-stage reverse osmosis +EDI electric desalting + polishing mixed bed treatment technology is adopted. Reverse osmosis treatment is used in the pre-pretreatment part, which can effectively remove various salts and impurities in the water. Then EDI electric desalting and polishing mixed bed technology can effectively remove soluble ions in the water. Further improve the effluent water quality, so that the final effluent water quality meets the water technology requirements.
In the large-scale integrated circuit ultra-pure water quality, the priority to get attention to the water quality indicators are: resistivity, TOC, silicon, particles, heavy metals, dissolved oxygen, alkali metals, etc., such substances will dissolve in water, and in the manufacturing process of integrated circuit chips, the more ionic components in the water used, the greater the impact on the manufacturing process of the product, making the product yield reduced.
The ultra-pure water equipment of integrated circuit is often used in the cleaning of industrial semiconductor raw materials and used utensils, the production of photoetching mask plate and the water vapor source for silicon wafer oxidation. In addition, the production of vacuum tubes, thick film and thin film circuits, solid state electronic devices, printed circuits, etc., also need to use ultra-pure water. With the continuous development of science and technology, the integration of integrated circuits is increasing day by day, and the requirements for water quality are also increasing, so that the sustainability of ultra-pure water treatment processes and products, the continuity of production, the automation and simplicity of equipment are put forward more stringent requirements.
Equipment features:
1. Imported booster pump, low noise, high efficiency, stable and reliable
2. Automatic electronic control program, can also be optional touch screen operation, easy to use.
3. Automatic pretreatment system is adopted to achieve unmanned operation and reduce manual maintenance costs.
4. Imported reverse osmosis membrane, high desalting rate, long service life, low operating cost.
5. Personalized design in line with local water quality to meet the needs in an all-round way.
6. Online water quality monitoring and control, real-time monitoring of water quality changes to ensure water quality safety.
7. Save recycled water and recycled sewage treatment facilities, high water production rate (up to 95%).
8. There is no need for acid-base reserve and acid-base dilution transport facilities, which is safe and reliable to use and avoid workers' exposure to acid-base.
9. Simplify the installation process and reduce the site footprint.
Application field:
1. Semiconductor materials, devices, printed circuit boards and integrated circuits finished, semi-finished products with ultra-pure water.
2. Transistor production is mainly used for cleaning silicon wafers, and a small amount is used for pharmaceutical liquid preparation.
3. Production, processing and cleaning of semiconductor materials and wafer materials.
4. Integrated circuit production in high purity water cleaning silicon chips.
5. Tube production, tube cathode coated with carbonate solution.
6. Photoelectric products, other high-tech precision products.
7. Pure water for picture tube and cathode ray tube production and batching.
8. Electrolytic capacitor production aluminum foil and working parts cleaning.