Single Silicon Crystal Ultra-pure Water System
Process flow:
Raw water tank → raw water lifting pump → quartz sand filter → activated carbon filter → water softening device → precision filter → primary high pressure pump → primary reverse osmosis → interstage water tank → secondary high pressure pump → intermediate water tank →EDI lifting pump → Microporous filter →EDI system →EDI water tank → Polishing mixed bed → water point (≥18.2 mo.cm)
The main function of the single silicon crystal ultrapure water equipment is to remove surface contamination impurities, including organic matter and inorganic matter, some of these impurities exist in the atomic state, ion state, film form, particle form and the surface of the silicon wafer. Organic pollution includes photoresist, organic solvent residue, organic pollution includes photoresist, organic solvent residue, synthetic wax and grease or fiber brought by human contact devices, tools and utensils. Inorganic pollution, including heavy metals such as chromium, copper, iron and gold, seriously affects the life of minority carriers and surface conductance. Alkali metals, such as sodium, cause serious leakage; Particle pollution sources include organic colloidal fibers, microorganisms, bacteria, dust, silicon slag and other substances, such substances will cause varying degrees of harm in the production process, so the current semiconductor device production, solar cell silicon, polysilicon, monocrystalline silicon production process need to use ultra-pure water to wash, to ensure that the overall process of harm to minimize.
The equipment adopts domestic advanced technology, and uses international imported parts, coupled with the company's unique management experience concept, to produce high-quality ultra-pure water equipment that meets the application of single silicon crystal industry.
Equipment performance:
1. The pretreatment system is a device using the current technology, and its water purification effect is remarkable. Can remove bacteria, sediment, colloids, suspended solids, odor and other impurities in the water. If the hardness of the water is higher, it will also reduce the hardness of the water.
2. Reverse osmosis technology is mainly composed of high pressure pump, membrane gram, and imported reverse osmosis membrane components, instruments, control electrical, etc. The conductivity of the water decreases and the resistivity increases.
3. The post-treatment part is to further deepen the treatment of pure water prepared by reverse osmosis. The resistivity of the water can reach 18.2 megohm, so that the produced water meets the best chip cleaning standards.
4. The desalting core component of the ultrapure water equipment is the imported reverse osmosis membrane component, and the ultrapure water equipment is generally composed of a pre-treatment device, reverse osmosis technology, and post-treatment by polishing mixed bed and EDI system, which makes its water purification effect remarkable.
After the treatment of these parts of the water can meet the requirements of ultra-pure water for monocrystalline silicon cleaning, some production enterprises require that the water cannot contain microorganisms, fungi, etc., so it will be installed in the back of the UV lamp sterilization device to ensure that the water quality meets the production requirements.