Solar Photovoltaic Ultra-pure Water System
Process flow:
Pretreatment - Reverse Osmosis - Intermediate tank - Water pump -EDI unit - Purification tank - Pure water pump - UV sterilizer -0.2 or 0.5μm precision filter - Water object
Pretreatment - Reverse Osmosis - Intermediate tank - Water pump -EDI unit - Purification tank - pure water pump - UV sterilizer - Refined polishing mixing bed -TOC resolver -0.2 or 0.5μm precision filter - Water object
Solar photovoltaic industry In the production of tubes, the tube cathode of the photovoltaic industry is coated with carbonate. If impurities are mixed in this process, it will affect the emission of electrons, thus affecting the amplification performance of the tube and its life, so when the equipment is processed, it is necessary to match ultra-pure water. In the production of picture tube and cathode ray tube, the inner wall of the fluorescent screen is attached with a layer of fluorescent material by spraying or precipitation method, which is the fluorescent powder particles composed of zinc or other metal sulfide and bonded with potassium silicate. If the pure water contains copper above 8ppb, it will cause photodiscolouration; Iron content above 50ppb will make the light discoloration, darken, flash and will cause bubbles, tracks, light leakage points and other waste products, so in the production process also need to use ultra-pure water.
The EDI membrane stack of solar photovoltaic ultra-pure water equipment is composed of a certain number of units sandwiched between two electrodes. There are two different types of chambers in each unit: the fresh water chamber to be desalted, the D chamber, and the concentrated water chamber to collect the removed impurity ions, the C chamber. The D chamber is filled with a mixture of positive and anion exchange resins located between two membranes: a cation exchange membrane that allows only cation and an anion exchange membrane that allows only anions to pass through.
Process features:
1. The traditional ultra-pure water preparation process requires the use of chemicals for acid-base regeneration in the mixed-bed resin part, while the new technology uses EDI equipment to combine electrodialysis and ion exchange technology, thereby eliminating the treatment of these harmful substances and heavy work, reducing labor and maintenance costs.
2. The old mixed bed process can not be accurately controlled due to each regeneration and water quality change, thus making the overall operation process complicated, while the EDI production process is continuous and stable to produce water quality, eliminating the complex operation process, making the overall operation simple.
3.EDI electric desalting system is smaller than the same level of water output mixed bed, EDI equipment is composed of building block structure, can be flexibly constructed according to the situation of the site, modular design, making EDI in production and maintenance are extremely convenient.
4.EDI equipment operating costs include power consumption, water consumption, pharmaceutical costs and equipment depreciation costs, eliminating the traditional process of acid and alkali consumption, recycled water, wastewater treatment and sewage discharge costs, so in the long run, the use of EDI equipment investment costs will be able to be fully recovered within a few years.
Application field:
1. Electrolytic capacitor production aluminum foil and working parts cleaning.
2. Tube production, tube cathode coated with carbonate solution.
3. Pure water for picture tube and cathode ray tube production and dosing.
4. Black and white picture tube screen production, glass shell cleaning, precipitation, wetting, film washing, tube neck cleaning with pure water.
5. The production of liquid crystal display and the screen surface need to be cleaned with pure water and dispensed with pure water.
6. Transistor production is mainly used for cleaning silicon wafers, and a small amount is used for pharmaceutical liquid preparation.
7. Integrated circuit production in high purity water to clean silicon wafers.
8. Semiconductor materials, devices, printed circuit boards and integrated circuits.
9. LCD LCD display, PDP plasma display.
10. High-quality picture tube, fluorescent powder production.
11. Wafer material production, processing, cleaning.
12. Ultra-pure materials and ultra-pure chemical reagents, ultra-pure chemical materials.
13. Photoelectric products, other high-tech precision products.
14. Water for electroplating (gold plating, silver plating, plastic plating, chrome plating, zinc plating, etc.).
15. Glass coating with high purity water.